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Stability and Activity of Non‐Noble‐Metal‐Based Catalysts Toward the Hydrogen Evolution Reaction
Author(s) -
Ledendecker Marc,
Mondschein Jared S.,
Kasian Olga,
Geiger Simon,
Göhl Daniel,
Schalenbach Max,
Zeradjanin Aleksandar,
Cherevko Serhiy,
Schaak Raymond E.,
Mayrhofer Karl
Publication year - 2017
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201704021
Subject(s) - noble metal , dissolution , catalysis , platinum , precious metal , materials science , chemical engineering , chemistry , base metal , hydrogen , nanotechnology , inorganic chemistry , metallurgy , organic chemistry , welding , engineering
A fundamental understanding of the behavior of non‐noble based materials toward the hydrogen evolution reaction is crucial for the successful implementation into practical devices. Through the implementation of a highly sensitive inductively coupled plasma mass spectrometer coupled to a scanning flow cell, the activity and stability of non‐noble electrocatalysts is presented. The studied catalysts comprise a range of compositions, including metal carbides (WC), sulfides (MoS 2 ), phosphides (Ni 5 P 4 , Co 2 P), and their base metals (W, Ni, Mo, Co); their activity, stability, and degradation behavior was elaborated and compared to the state‐of‐the‐art catalyst platinum. The non‐noble materials are stable at HER potentials but dissolve substantially when no current is flowing. Through pre‐ and post‐characterization of the catalysts, explanations of their stability (thermodynamics and kinetics) are discussed, challenges for the application in real devices are analyzed, and strategies for circumventing dissolution are suggested. The precise correlation of metal dissolution with applied potential/current density allows for narrowing down suitable material choices as replacement for precious group metals as for example, platinum and opens up new ways in finding cost‐efficient, active, and stable new‐generation electrocatalysts.