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Photocatalytic Nanosheet Lithography: Photolithography based on Organically Modified Photoactive 2D Nanosheets
Author(s) -
Ganter Pirmin,
Lotsch Bettina V.
Publication year - 2017
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201703149
Subject(s) - nanosheet , photolithography , photoresist , materials science , photocatalysis , nanotechnology , lithography , aqueous solution , chemical engineering , optoelectronics , chemistry , catalysis , organic chemistry , layer (electronics) , engineering
Harvesting the properties of nanosheets is not only crucial from a fundamental perspective, but also for the development of novel functional devices based on 2D nanosheets. Herein, we demonstrate the processing of organically modified TBA x H 1− x Ca 2 Nb 3 O 10 nanosheets into photonic thin films and study their colorimetric sensing properties in response to various aqueous and organic solvent vapors. Building on the enhanced solvent accessibility of TBA‐containing nanosheets and their photocatalytic activity under UV irradiation, we develop a new concept for photocatalytic lithography using TBA x H 1− x Ca 2 Nb 3 O 10 nanosheets as a negative photoresist to obtain high‐fidelity micron‐scale patterns of robust inorganic nanosheets. Photocatalytic nanosheet lithography (PNL) therefore adds a new resist‐free, resource efficient direct patterning technique to the toolbox of photolithography.