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Water Transport with Ultralow Friction through Partially Exfoliated g‐C 3 N 4 Nanosheet Membranes with Self‐Supporting Spacers
Author(s) -
Wang Yanjie,
Li Libo,
Wei Yanying,
Xue Jian,
Chen Huang,
Ding Li,
Caro Jürgen,
Wang Haihui
Publication year - 2017
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201701288
Subject(s) - nanosheet , membrane , permeance , permeation , materials science , nanopore , nanotechnology , chemical engineering , nanofluidics , molecule , water transport , self assembly , fabrication , water flow , chemistry , organic chemistry , medicine , biochemistry , alternative medicine , pathology , engineering , environmental engineering
Two‐dimensional (2D) graphitic carbon nitride (g‐C 3 N 4 ) nanosheets show brilliant application potential in numerous fields. Herein, a membrane with artificial nanopores and self‐supporting spacers was fabricated by assembly of 2D g‐C 3 N 4 nanosheets in a stack with elaborate structures. In water purification the g‐C 3 N 4 membrane shows a better separation performance than commercial membranes. The g‐C 3 N 4 membrane has a water permeance of 29 L m −2  h −1  bar −1 and a rejection rate of 87 % for 3 nm molecules with a membrane thickness of 160 nm. The artificial nanopores in the g‐C 3 N 4 nanosheets and the spacers between the partially exfoliated g‐C 3 N 4 nanosheets provide nanochannels for water transport while bigger molecules are retained. The self‐supported nanochannels in the g‐C 3 N 4 membrane are very stable and rigid enough to resist environmental challenges, such as changes to pH and pressure conditions. Permeation experiments and molecular dynamics simulations indicate that a novel nanofluidics phenomenon takes place, whereby water transport through the g‐C 3 N 4 nanosheet membrane occurs with ultralow friction. The findings provide new understanding of fluidics in nanochannels and illuminate a fabrication method by which rigid nanochannels may be obtained for applications in complex or harsh environments.

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