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UV‐Induced Disulfide Formation and Reduction for Dynamic Photopatterning
Author(s) -
Li Lei,
Feng Wenqian,
Welle Alexander,
Levkin Pavel A.
Publication year - 2016
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201607276
Subject(s) - disulfide bond , surface modification , thiol , chemistry , photochemistry , molybdenum disulfide , combinatorial chemistry , materials science , organic chemistry , biochemistry , metallurgy
UV‐induced disulfide formation (UV‐DF) and disulfide reduction (UV‐DR) reactions for surface functionalization and dynamic photopatterning are presented. Both photochemical reactions allow for the spatially and temporally controlled, reversible transition between thiol‐ and disulfide‐functionalized surfaces. The dynamic photopatterning strategy was demonstrated by the UV‐induced attachment, exchange, and detachment on thiol‐modified substrates.

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