Exergonic and Spontaneous Production of Radicals through Beryllium Bonds

High‐level ab initio calculations show that the formation of radicals, by the homolytic bond fission of Y−R (Y=F, OH, NH 2 ; R=CH 3 , NH 2 , OH, F, SiH 3 , PH 2 , SH, Cl, NO) bonds is dramatically favored by the association of the molecule with BeX 2 (X=H and Cl) derivatives. This finding is a consequence of two concomitant effects, the significant activation of the Y−R bond after the formation of the beryllium bond, and the huge stabilization of the F . (OH . , NH 2 . ) radical upon BeX 2 attachment. In those cases where R is an electronegative group, the formation of the radicals is not only exergonic, but spontaneous.