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Patternable Large‐Scale Molybdenium Disulfide Atomic Layers Grown by Gold‐Assisted Chemical Vapor Deposition
Author(s) -
Song Intek,
Park Chibeom,
Hong Misun,
Baik Jaeyoon,
Shin HyunJoon,
Choi Hee Cheul
Publication year - 2014
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201309474
Subject(s) - chemical vapor deposition , materials science , alloy , molybdenum disulfide , catalysis , lithography , substrate (aquarium) , atomic units , atomic layer deposition , nanotechnology , deposition (geology) , chemical engineering , thin film , optoelectronics , chemistry , metallurgy , organic chemistry , paleontology , oceanography , physics , quantum mechanics , sediment , geology , engineering , biology
A novel way to grow MoS 2 on a large scale with uniformity and in desired patterns is developed. We use Au film as a catalyst on which [Mo(CO) 6 ] vapor decomposes to form a Mo‐Au surface alloy that is an ideal Mo reservoir for the growth of atomic layers of MoS 2 . Upon exposure to H 2 S, this surface alloy transforms into a few layers of MoS 2 , which can be isolated and transferred on an arbitrary substrate. By simply patterning Au catalyst film by conventional lithographic techniques, MoS 2 atomic layers in desired patterns can be fabricated.

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