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XUV‐induced transient phase gratings for probing ultra‐fast carrier generation and recombination processes in wide‐bandgap semiconductors
Author(s) -
Gabrysch Markus,
Schwenke Jörg,
Balciunas Tadas,
He Xinkui,
Rakowski Rafal,
Johnsson Per,
Canton Sophie E.,
Isberg Jan,
L'Huillier Anne
Publication year - 2013
Publication title -
annalen der physik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.009
H-Index - 68
eISSN - 1521-3889
pISSN - 0003-3804
DOI - 10.1002/andp.201200187
Subject(s) - extreme ultraviolet , materials science , grating , high harmonic generation , optics , optoelectronics , semiconductor , transient (computer programming) , carrier lifetime , band gap , diffraction grating , diffraction , diffraction efficiency , refractive index , photon energy , phase (matter) , photon , physics , laser , silicon , quantum mechanics , computer science , operating system
A method for probing the temporal evolution of ultra‐fast carrier generation and recombination processes in wide‐bandgap semiconductors, e.g. diamond, is described. Two extreme ultraviolet (pump) pulses produced by high‐order harmonic generation in Argon gas (with a photon energy of 32 eV) are superimposed on a sample with a small angle between them, inducing periodic changes in the refractive index of the material causing it to act as a transient diffraction grating. A delayed synchronized infrared (probe) pulse gets diffracted on the induced phase grating and is detected in the first diffraction order. By varying the time‐delay between pump and probe, the full temporal evolution of the free carrier generation and recombination processes can be resolved. Feasibility calculations and the first steps towards experimental implementation are presented.