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Mechanisms of photoresist dissolution
Author(s) -
Hunek Balazs,
Cussler E. L.
Publication year - 2002
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690480403
Subject(s) - dissolution , sodium hydroxide , aqueous solution , chemistry , photoresist , chemical engineering , base (topology) , polymer , mass transfer , hydroxide , phase (matter) , materials science , chromatography , organic chemistry , layer (electronics) , mathematical analysis , mathematics , engineering
The comprehensive physical picture developed describes the dissolution of a broad range of materials, including novolak‐based photoresists and can be applied to the dissolution in aqueous base of both small molecules and polymers that can ionize. The model was verified by measuring the dissolution of solute‐coated spinning discs. Key experimental variables included the flow (as a Reynolds number) and the base concentration, which was in this case of sodium hydroxide. The physical and chemical characteristics of the dissolving species determine the rate‐limiting steps, which cause different dissolution behavior. The dissolution of low molecular weight phenolic resin is controlled by a combination of solute release and solute mass transfer, without the formation of any significant intermediate gel phase. Several other dissolution mechanisms are rationalized based on a simple “strings of buoys” analogy, which can be extended to other cases as well.