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Novel swirl‐flow reactor for kinetic studies of semiconductor photocatalysis
Author(s) -
Ray Ajay K.,
Beenackers Antonie A. C. M.
Publication year - 1997
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690431018
Subject(s) - photocatalysis , catalysis , residence time distribution , mass transfer , continuous reactor , plug flow , semiconductor , kinetic energy , light intensity , reaction rate constant , kinetics , chemical engineering , materials science , absorption (acoustics) , chemistry , optoelectronics , chromatography , optics , mineralogy , thermodynamics , composite material , organic chemistry , inclusion (mineral) , physics , quantum mechanics , engineering
A new two‐phase swirl‐flow monolithic‐type reactor was designed to study the kinetics of heterogeneous photocatalytic processes on immobilized semiconductor catalysts. True kinetic rate constants for destruction of a textile dye were measured as a function of wavelength of light intensity and angle of incidence, catalyst layer thickness, and the effect of absorption of light by liquid film on the overall rate of photocatalytic degradation. Photocatalytic activities of two commercially available TiO 2 catalysts (Degussa P25 and Hombikat UV 100) were also compared for different light intensities and catalyst layer thickness. Residence time distribution and mass‐transfer limitations were evaluated. This new reactor appears to be an attractive choice for kinetic studies of heterogeneous photocatalysis.