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Propagation of oscillations during ethylene oxidation on a Rh/SiO 2 catalyst
Author(s) -
Kellow John C.,
Wolf Eduardo E.
Publication year - 1991
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690371209
Subject(s) - wafer , catalysis , ethylene , ignition system , chemistry , front (military) , oscillation (cell signaling) , analytical chemistry (journal) , chemical engineering , materials science , thermodynamics , nanotechnology , meteorology , chromatography , organic chemistry , physics , biochemistry , engineering
Infrared imaging is used to visualize nonuniform temperature patterns occurring on a Rh/SiO 2 catalyst wafer during the total oxidation of ethylene. Ignition of the catalyst wafer is seen to occur as a propagating reaction front originating at a single point on the wafer. During self‐sustained oscillations, the reaction zone contracts, expands, and changes shape. Thermographic data of the oscillations are analyzed by calculating the size and mean temperature of the reaction zone. This analysis reveals that the observed oscillations in the bulk CO 2 concentration correlate mainly with changes in the size of the reacting zone.