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Model of particle‐vapor codeposition with application to ceramic materials synthesis
Author(s) -
Hurt Robert H.,
Allendorf Mark D.
Publication year - 1991
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690371006
Subject(s) - plasma enhanced chemical vapor deposition , deposition (geology) , ceramic , particle (ecology) , chemical vapor deposition , materials science , porosity , particle deposition , water vapor , chemical engineering , particle size , porous medium , range (aeronautics) , nanotechnology , mineralogy , composite material , chemistry , engineering , geology , paleontology , oceanography , organic chemistry , sediment
The simultaneous deposition of particles and material from the vapor phase gives rise to surface deposits having characteristic structure. A mathematical model of the particle‐vapor codeposition process is developed that predicts the structure and properties of these deposits as well as their growth rate over a wide range of conditions. A random sphere formulation is developed that provides the framework for a unified treatment of both subprocesses: ballistic particle deposition and porous media densification through vapor deposition. The model is applied to particleenhanced chemical vapor deposition (PECVD) processes for the production of ceramic materials. In PECVD, particles are introduced into a CVD process, either in the form of an aerosol created in situ by a controlled amount of gas‐to‐particle conversion or in the form of independently charged powder. The model identifies PECVD conditions that produce deposition rates substantially higher than those achievable by conventional CVD.