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Ultrapurification of SiCl 4 by photochlorination in a bubble column reactor
Author(s) -
Mixon David A.,
Bohrer Michael P.,
O'Hara Patricia A.
Publication year - 1990
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690360207
Subject(s) - trichlorosilane , bubble , chemistry , bubble column reactor , mass transfer , analytical chemistry (journal) , chromatography , gas bubble , organic chemistry , mechanics , physics , silicon
The development and performance of a bubble column photoreactor for ultrapurification of SiCl 4 is described. Trichlorosilane (SiHCl 3 ), the principle contaminant in SiCl 4 commercially available for use in optical fiber manufacture, is converted to SiCl 4 and HCl by UV‐initiated photochlorination. Studies of the homogeneous photochlorination kinetics and of Cl 2 gas absorption in a bubble column were undertaken. In addition, an extensive set of data was collected from continuous‐flow bubble column reactor (BCR) runs. The rate of photochlorination in the BCR was found to be mass‐transfer‐limited. A simple model of BCR performance, incorporating the effect of Cl 2 mass transfer rate enhancement by chemical reaction, was tested that agrees well with the experimental data. The BCR was found to be operable over a wide range of SiHCl 3 concentrations and SiCl 4 feed rates, and capable of lowering the concentration of SiHCl 3 in product to below measurable levels (<1 ppm).