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A mathematical model of pulse plating on a rotating disk electrode
Author(s) -
Yin KenMing,
White Ralph E.
Publication year - 1990
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690360204
Subject(s) - plating (geology) , electrode , rotating disk electrode , pulse (music) , diffusion , nickel , convection , materials science , mechanics , mass transport , mass transfer , chemistry , metallurgy , thermodynamics , physics , optics , electrochemistry , cyclic voltammetry , engineering physics , geophysics , detector
A galvanostatic pulse plating model is presented for the electrodeposition of an alloy on a rotating disk electrode. This model is used to simulate the electrodeposition of nickel/chrome alloys. The mass transport equations used in the model include the effects of diffusion, migration and convection; and the electrode kinetics are described by the Butler‐Volmer equation. It is predicted that the effect of ionic migration is significant and therefore should be included in models of pulse plating.