Premium
Statistical characteristics of thin, wavy films III. Structure of the large waves and their resistance to gas flow
Author(s) -
Chu K. J.,
Dukler A. E.
Publication year - 1975
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.690210323
Subject(s) - drag , mechanics , mechanical wave , pressure drop , materials science , flow (mathematics) , longitudinal wave , wave propagation , physics , optics
Two classes of random waves exist on falling films at flow rates of practical interest; large waves which carry the bulk of the liquid and small waves which cover the substrate. In this paper statistics of the large waves are presented and compared with existing theory. These waves are bimodal in character at Re L > 700. The form drag of the large waves is shown to contribute negligibly the observed pressure drop in the gas phase. It is thus concluded that the small wave structure controls the fluid resistance and transfer processes in the gas while the large waves control these same processes in the liquid film.