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Facile growth of 1‐D nanowire‐based WO 3 thin films with enhanced photoelectrochemical performance
Author(s) -
Ding JinRui,
Kim KyoSeon
Publication year - 2016
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.15105
Subject(s) - materials science , thin film , water splitting , nanowire , annealing (glass) , tungsten , chemical vapor deposition , nanotechnology , oxide , chemical engineering , optoelectronics , deposition (geology) , composite material , catalysis , photocatalysis , metallurgy , chemistry , paleontology , biochemistry , sediment , engineering , biology
A flame reactor embedded with a constant tungsten wire feeding system to prepare one‐dimensional (1‐D) nanostructured tungsten oxide thin film for photoelectrochemical (PEC) water splitting was developed. Photoactive vertically‐aligned nanowire‐based WO 3 thin films could be obtained with a controlled thickness via a flame vapor deposition process followed by air‐annealing. The PEC performances of WO 3 photoelectrodes for different thin film thicknesses were examined. The optimum thickness of WO 3 thin film was found to be about 7.2 μm for PEC water splitting based on incident photon‐to‐current efficiency plots and I–V curves. The WO 3 prepared with optimum thickness showed better PEC performance than those of recently reported nanostructured WO 3 photoanodes. © 2015 American Institute of Chemical Engineers AIChE J , 62: 421–428, 2016
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