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Evolution of particle size distribution in a pulsed SiH 4 plasma process
Author(s) -
Kim DongJoo,
Kim KyoSeon
Publication year - 2008
Publication title -
aiche journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.958
H-Index - 167
eISSN - 1547-5905
pISSN - 0001-1541
DOI - 10.1002/aic.11582
Subject(s) - particle size distribution , process (computing) , particle size , plasma , materials science , particle (ecology) , process engineering , statistical physics , chemical engineering , physics , computer science , nuclear physics , engineering , geology , oceanography , operating system
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