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Structural Evolution During Perovskite Crystal Formation and Degradation: In Situ and Operando X‐Ray Diffraction Studies
Author(s) -
Mundt Laura E.,
Schelhas Laura T.
Publication year - 2020
Publication title -
advanced energy materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.08
H-Index - 220
eISSN - 1614-6840
pISSN - 1614-6832
DOI - 10.1002/aenm.201903074
Subject(s) - materials science , perovskite (structure) , in situ , annealing (glass) , halide , scattering , nanotechnology , degradation (telecommunications) , thin film , diffraction , crystal (programming language) , chemical physics , chemical engineering , optics , computer science , chemistry , inorganic chemistry , metallurgy , telecommunications , physics , organic chemistry , engineering , programming language
Abstract This review provides an update on the progress in understanding formation and degradation mechanisms in halide perovskites for photovoltaic applications, as supported by in situ and operando X‐ray scattering techniques. The value of these real‐time analyses is particularly high for gaining insights into the structural evolution during crystal formation and decomposition upon exposure to external stress factors. This type of analysis reveals the pathways between starting and end points of a process rather than being limited to comparing states before and after the process. Special attention is put on the successful efforts toward upscaling including deposition techniques that are compatible to roll‐to‐roll processing. These processes are realized using fast annealing procedures. The development of these processes strongly benefited from in situ studies exploring the direct transition from precursor to perovskite without going through observable crystalline intermediate phases. A particular focus of this review is the benefit of using in situ and operando X‐ray scattering techniques to better understand and ultimately improve device stability. The difference between structural stability of thin films and structural stability under device operation is highlighted, convincingly demonstrating the indispensability of operando studies.