z-logo
Premium
High Fill Factor Polymer Solar Cells Incorporating a Low Temperature Solution Processed WO 3 Hole Extraction Layer
Author(s) -
Stubhan Tobias,
Li Ning,
Luechinger Norman A.,
Halim Samuel C.,
Matt Gebhard J.,
Brabec Christoph J.
Publication year - 2012
Publication title -
advanced energy materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.08
H-Index - 220
eISSN - 1614-6840
pISSN - 1614-6832
DOI - 10.1002/aenm.201200330
Subject(s) - materials science , pedot:pss , tungsten trioxide , polymer solar cell , chemical engineering , annealing (glass) , tungsten , photoactive layer , molybdenum trioxide , diode , optoelectronics , open circuit voltage , fullerene , layer (electronics) , energy conversion efficiency , nanotechnology , molybdenum , organic chemistry , composite material , voltage , chemistry , physics , quantum mechanics , engineering , metallurgy
We demonstrate solution‐processed tungsten trioxide (WO 3 ) incorporated as hole extraction layer (HEL) in polymer solar cells (PSCs) with active layers comprising either poly(3‐hexylthiophene) (P3HT) or poly[(4,4'‐bis(2‐ethylhexyl)dithieno[3,2‐b:2′,3′‐d]silole)‐2,6‐diyl‐alt‐(4,7‐bis(2‐thienyl)‐2,1,3‐benzothiadiazole)‐5,50‐diyl] (Si‐PCPDTBT) mixed with a fullerene derivative. The WO 3 layers are deposited from an alcohol‐based, surfactant‐free nanoparticle solution. A short, low‐temperature (80 °C) annealing is sufficient to result in fully functional films without the need for an oxygen‐plasma treatment. This allows the application of the WO 3 buffer layer in normal as well as inverted architecture solar cells. Normal architecture devices based on WO 3 HELs show comparable performance to the PEDOT:PSS reference devices with slightly better fill factors and open circuit voltages. Very high shunt resistances (over 1 MΩ cm 2 ) and excellent diode rectification underline the charge selectivity of the solution‐processed WO 3 layers.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom