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Nanostructured Platinum Catalysts by Atomic‐Layer Deposition for Solid‐Oxide Fuel Cells
Author(s) -
Chao ChengChieh,
Motoyama Munekazu,
Prinz Fritz B.
Publication year - 2012
Publication title -
advanced energy materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.08
H-Index - 220
eISSN - 1614-6840
pISSN - 1614-6832
DOI - 10.1002/aenm.201200002
Subject(s) - atomic layer deposition , sputtering , materials science , platinum , catalysis , oxide , deposition (geology) , fuel cells , layer (electronics) , nanotechnology , nanostructure , chemical engineering , thin film , metallurgy , chemistry , organic chemistry , paleontology , biology , sediment , engineering
Atomic‐layer deposition (ALD) and sputtering of platinum are used to create catalyst nanostructures with high triple‐phase‐boundary (TPB) densities and a low current‐collecting resistance for solid‐oxide fuel cells (SOFCs). A 90% increase in the fuel‐cell peak power density is observed relative to catalyst structures that are deposited using sputtering only.