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Highly Efficient Silicon Nanoarray Solar Cells by a Single‐Step Plasma‐Based Process
Author(s) -
Xu S.,
Huang S. Y,
Levchenko I.,
Zhou H. P.,
Wei D. Y.,
Xiao S. Q.,
Xu L. X.,
Yan W. S.,
Ostrikov K.
Publication year - 2011
Publication title -
advanced energy materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.08
H-Index - 220
eISSN - 1614-6840
pISSN - 1614-6832
DOI - 10.1002/aenm.201100085
Subject(s) - materials science , wafer , etching (microfabrication) , plasma etching , plasma , silicon , nanotechnology , process (computing) , simple (philosophy) , optoelectronics , computer science , physics , quantum mechanics , operating system , philosophy , epistemology , layer (electronics)
Highly efficient solar cells (conversion efficiency 11.9%, fill factor 70%) based on the vertically aligned single‐crystalline nanostructures are fabricated without any pre‐fabricated p‐n junctions in a very simple, single‐step process of Si nanoarray formation by etching p‐type Si(100) wafers in low‐temperature environment‐friendly plasmas of argon and hydrogen mixtures.