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Effect of Annealing Ferroelectric HfO 2 Thin Films: In Situ, High Temperature X‐Ray Diffraction
Author(s) -
Park Min Hyuk,
Chung ChingChang,
Schenk Tony,
Richter Claudia,
Opsomer Karl,
Detavernier Christophe,
Adelmann Christoph,
Jones Jacob L.,
Mikolajick Thomas,
Schroeder Uwe
Publication year - 2018
Publication title -
advanced electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.25
H-Index - 56
ISSN - 2199-160X
DOI - 10.1002/aelm.201800091
Subject(s) - materials science , ferroelectricity , annealing (glass) , orthorhombic crystal system , diffraction , crystallization , thin film , crystallography , x ray crystallography , optoelectronics , crystal structure , nanotechnology , dielectric , chemical engineering , optics , composite material , chemistry , physics , engineering
The ferroelectricity in fluorite oxides has gained increasing interest due to its promising properties for multiple applications in semiconductor as well as energy devices. The structural origin of the unexpected ferroelectricity is now believed to be the formation of a non‐centrosymmetric orthorhombic phase with the space group of Pca 2 1 . However, the factors driving the formation of the ferroelectric phase are still under debate. In this study, to understand the effect of annealing temperature, the crystallization process of doped HfO 2 thin films is analyzed using in situ, high‐temperature X‐ray diffraction. The change in phase fractions in a multiphase system accompanied with the unit cell volume increase during annealing could be directly observed from X‐ray diffraction analyses, and the observations give an information toward understanding the effect of annealing temperature on the structure and electrical properties. A strong coupling between the structure and the electrical properties is reconfirmed from this result.