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Defining Switching Efficiency of Multilevel Resistive Memory with PdO as an Example
Author(s) -
Rao K. D. M.,
Sagade Abhay A.,
John Robin,
Pradeep T.,
Kulkarni G. U.
Publication year - 2016
Publication title -
advanced electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.25
H-Index - 56
ISSN - 2199-160X
DOI - 10.1002/aelm.201500286
Subject(s) - resistive random access memory , materials science , non volatile memory , optoelectronics , voltage , neuromorphic engineering , raman spectroscopy , resistive touchscreen , random access memory , reading (process) , electrical engineering , computer science , physics , optics , machine learning , artificial neural network , law , computer hardware , political science , engineering
Resistive random access memory (RRAM) is the most promising candidate for next generation nonvolatile memory. In this article, resistive switching in PdO thin film is investigated. The fabricated in‐plane devices showed voltage pulse induced multilevel resistive switching (MRS) with as many as five states under ambient conditions with high degrees of retention and endurance. The I – V characteristics of the different memory states are linear and only a small reading voltage (≈10 mV) is necessary. Raman mapping of PdO (B 1g mode, 650 cm –1 ) and temperature‐dependent electrical transport measurements provide an insight into possible redox mechanism involving PdO/Pd particles. For the first time, the switching efficiency of a MRS device is uniquely defined in terms of a parameter called “multiplex number ( M ),” which is the sum of the total number of memory states and the ratio between the number of switching events observed in a device and the total number of possible switching events. The present PdO MRS device exhibits the highest M value compared to the values evaluated from the literature examples. Such high performance MRS in PdO devices makes them potential candidates for RRAM and neuromorphic circuit applications.