z-logo
open-access-imgOpen Access
Metal‐Halide Perovskite Design for Next‐Generation Memories: First‐Principles Screening and Experimental Verification
Author(s) -
Jung JuHyun,
Kim Seong Hun,
Park Youngjun,
Lee Donghwa,
Lee JangSik
Publication year - 2020
Publication title -
advanced science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.388
H-Index - 100
ISSN - 2198-3844
DOI - 10.1002/advs.202001367
Subject(s) - materials science , halide , perovskite (structure) , voltage , optoelectronics , computer science , ionic bonding , nanotechnology , electrical engineering , chemistry , crystallography , engineering , inorganic chemistry , ion , organic chemistry
Memory devices have been advanced so much, but still it is highly required to find stable and reliable materials with low‐power consumption. Halide perovskites (HPs) have been recently adopted for memory application since they have advantages of fast switching based on ionic motion in crystal structure. However, HPs also suffer from poor stability, so it is necessary to improve the stability of HPs. In this regard, combined first‐principles screening and experimental verification are performed to design HPs that have high environmental stability and low‐operating voltage for memory devices. First‐principles screening identifies 2D layered AB 2 X 5 structure as the best candidate switching layer for memory devices, because it has lower formation energy and defect formation energy than 3D ABX 3 or other layered structures (A 3 B 2 X 7 , A 2 BX 4 ). To verify results, all‐inorganic 2D layered CsPb 2 Br 5 is synthesized and used in memory devices. The memory devices that use CsPb 2 Br 5 show much better stability and lower operating voltages than devices that use CsPbBr 3 . These findings are expected to provide new opportunity to design materials for reliable device applications based on calculation, screening, and experimental verification.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here