Open AccessNanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)
Author(s) -
Jeong HyeonHo,
Mark Andrew G.,
Lee TungChun,
Son Kwanghyo,
Chen Wenwen,
AlarcónCorrea Mariana,
Kim Insook,
Schütz Gisela,
Fischer Peer
Publication year - 2015
Publication title -
advanced science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.388
H-Index - 100
ISSN - 2198-3844
DOI - 10.1002/advs.201570022
Subject(s) - nanolithography , nanotechnology , materials science , plasmon , etching (microfabrication) , lithography , nanoparticle , optoelectronics , computer science , fabrication , layer (electronics) , medicine , alternative medicine , pathology
A parallel nanolithographic patterning method is presented by P. Fischer and co‐workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. Image by Alejandro Posada Boada.