Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications | Zendy

Jeong HyeonHo | Zendy; Mark Andrew G. | Zendy; Lee TungChun | Zendy; Son Kwanghyo | Zendy; Chen Wenwen | Zendy; AlarcónCorrea Mariana | Zendy; Kim Insook | Zendy; Schütz Gisela | Zendy; Fischer Peer | Zendy

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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

Author(s) -

Jeong HyeonHo,

Mark Andrew G.,

Lee TungChun,

Son Kwanghyo,

Chen Wenwen,

AlarcónCorrea Mariana,

Kim Insook,

Schütz Gisela,

Fischer Peer

Publication year - 2015

Publication title -

advanced science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 5.388

H-Index - 100

ISSN - 2198-3844

DOI - 10.1002/advs.201500016

Subject(s) - nanotechnology , lithography , materials science , nanolithography , wafer , multiple patterning , nanosphere lithography , next generation lithography , plasmon , fabrication , stencil lithography , electron beam lithography , resist , optoelectronics , medicine , alternative medicine , pathology , layer (electronics)

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications.

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