Open AccessSelectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
Author(s) -
Jeong HyeonHo,
Mark Andrew G.,
Lee TungChun,
Son Kwanghyo,
Chen Wenwen,
AlarcónCorrea Mariana,
Kim Insook,
Schütz Gisela,
Fischer Peer
Publication year - 2015
Publication title -
advanced science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.388
H-Index - 100
ISSN - 2198-3844
DOI - 10.1002/advs.201500016
Subject(s) - nanotechnology , lithography , materials science , nanolithography , wafer , multiple patterning , nanosphere lithography , next generation lithography , plasmon , fabrication , stencil lithography , electron beam lithography , resist , optoelectronics , medicine , alternative medicine , pathology , layer (electronics)
A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications.