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Development of a Method for Preparing a Highly Reactive and Stable, Recyclable and Environmentally Benign Organopalladium Catalyst Supported on Sulfur‐Terminated Gallium Arsenide(001): A Three‐Component Catalyst, {Pd}‐S‐GaAs(001), and its Properties
Author(s) -
Arisawa Mitsuhiro,
Hamada Masahiro,
Takamiya Ikuko,
Shimoda Masahiko,
Tsukamoto Shiro,
Arakawa Yasuhiko,
Nishida Atsushi
Publication year - 2006
Publication title -
advanced synthesis and catalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.541
H-Index - 155
eISSN - 1615-4169
pISSN - 1615-4150
DOI - 10.1002/adsc.200606025
Subject(s) - organopalladium , catalysis , chemistry , heck reaction , sulfur , palladium , x ray photoelectron spectroscopy , yield (engineering) , chemical engineering , organic chemistry , materials science , metallurgy , engineering
We have developed a method for preparing a recyclable and environmentally benign organopalladium catalyst for the Heck reaction supported on sulfur‐terminated gallium arsenide(001). This three‐component catalyst, {Pd}‐S‐GaAs(001), exhibited high stability and activity, furthermore, it tolerated reuse in 10 runs of the Heck reaction (average yield, 97 %) under aerobic conditions. The sulfur layer was very important to stabilize this catalyst. Only trace amounts of Pd were leached from this catalyst to the reaction mixture, as measured by ICP‐mass. The valence of immobilized Pd was zero by XPS spectrometry.