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Nanoscale Strain Engineering: Self‐Erasable and Rewritable Optoexcitonic Platform for Antitamper Hardware (Advanced Optical Materials 21/2020)
Author(s) -
Cheng CheHsuan,
Yang Da Seul,
Kim Jinsang,
Deotare Parag B.
Publication year - 2020
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.202070082
Subject(s) - materials science , tungsten diselenide , monolayer , diselenide , nanoscopic scale , nanotechnology , strain engineering , photoluminescence , optoelectronics , strain (injury) , optics , transition metal , chemistry , physics , medicine , biochemistry , selenium , silicon , metallurgy , catalysis
The cover image depicts a self‐erasable and rewritable optoexcitonic platform based on strain engineering of a tungsten diselenide (WSe 2 ) monolayer. The underlying photoactivated organic molecules generate large (>1%) local strain that results in a red shift of the WSe 2 photoluminescence, as shown by the letter “L”. The information is erased immediately with exposure to visible light or self‐erases over time. Such rewritable platform has promising applications in self‐destructible data and antitamper hardware. For further information see article number 2001287 by Parag B. Deotare and co‐workers.