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Photon Sieving: Selective and Sensitive Photon Sieve Based on III–V Semiconductor Nanowire Forest Fabricated by Lithography‐Free Process (Advanced Optical Materials 17/2020)
Author(s) -
Lee Gil Ju,
Park Kwangwook,
Kim Min Seok,
Chang Sehui,
Seok Tae Joon,
Park HongGyu,
Ju Gunwu,
Kim Kyujung,
Song Young Min
Publication year - 2020
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.202070070
Subject(s) - nanowire , materials science , lithography , semiconductor , photonics , nanoscopic scale , photon , optoelectronics , sieve (category theory) , nanotechnology , optics , physics , mathematics , combinatorics
In article number 2000198, Young Min Song and co‐workers report the theoretical and experimental demonstrations of a selective and sensitive photon sieve based on III–V semiconductor nanowire forests. The nanoscopic photonic phenomena of nanowire forests, which have been barely studied, are important for various applications such as physically unclonable functions and retinal prostheses. The cover image depicts the photon sieving effect by the implemented III–V nanowire‐based photon sieve.