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Ga 2 O 3 ‐Based Optical Applications: Gallium Oxide for High‐Power Optical Applications (Advanced Optical Materials 7/2020)
Author(s) -
Deng Huiyang,
Leedle Kenneth J.,
Miao Yu,
Black Dylan S.,
Urbanek Karel E.,
McNeur Joshua,
Kozák Martin,
Ceballos Andrew,
Hommelhoff Peter,
Solgaard Olav,
Byer Robert L.,
Harris James S.
Publication year - 2020
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.202070026
Subject(s) - materials science , wafer , optoelectronics , laser , fabrication , gallium , optical materials , optical power , power (physics) , gallium oxide , nanotechnology , optics , metallurgy , physics , medicine , alternative medicine , pathology , quantum mechanics
In article number 1901522, Huiyang Deng and co‐workers have leveraged the high laser damage threshold and moderate conductivity of Ga 2 O 3 to demonstrate the first Ga 2 O 3 ‐based laser accelerator and show Ga 2 O 3 as a promising material for high‐power optical applications. With the distinct properties of Ga 2 O 3 combined with advances in fabrication and wafer growth techniques, more Ga 2 O 3 ‐based high‐power optical applications will be realized in the near future.