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Self‐Limiting Growth of Ultrathin GaN/AlN Quantum Wells for Highly Efficient Deep Ultraviolet Emitters
Author(s) -
Kobayashi Hirotsugu,
Ichikawa Shuhei,
Funato Mitsuru,
Kawakami Yoichi
Publication year - 2019
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201900860
Subject(s) - materials science , quantum well , photoluminescence , optoelectronics , ultraviolet , spontaneous emission , epitaxy , wide bandgap semiconductor , quantum efficiency , monolayer , optics , layer (electronics) , nanotechnology , laser , physics
GaN/AlN ultrathin quantum wells (QWs) emitting in the deep UV spectral range are fabricated by metalorganic vapor phase epitaxy. The GaN thickness is automatically limited to the monolayer (ML) scale due to the balance between crystallization and evaporation of Ga adatoms. This growth characteristic facilitates the fabrication of highly reproducible GaN ML QWs. The strong quantum confinement within the GaN ML QWs achieves emissions below 250 nm. The photoluminescence intensity at room temperature with respect to that at low temperature, which is closely related to the emission internal quantum efficiency, is drastically improved from 0.1% for a conventional Al 0.8 Ga 0.2 N/AlN QWs to 5% for a 1 ML GaN/AlN (0001) QW and 50% for a 2 ML GaN/AlN (1 1 ¯ 02) QW under weak excitation conditions. These higher emission efficiencies are attributed to the suppressed nonradiative recombination in the GaN QWs and the enhanced radiative recombination in the (1 1 ¯ 02) QW.