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All‐Dielectric Silicon Metasurface with Strong Subterahertz Toroidal Dipole Resonance
Author(s) -
Zografopoulos Dimitrios C.,
Ferraro Antonio,
Algorri José Francisco,
MartínMateos Pedro,
GarcíaCámara Braulio,
MorenoOyervides Aldo,
Krozer Viktor,
Acedo Pablo,
Vergaz Ricardo,
SánchezPena José Manuel,
Beccherelli Romeo
Publication year - 2019
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201900777
Subject(s) - multipole expansion , terahertz radiation , toroid , materials science , dielectric , dipole , wafer , silicon , resonance (particle physics) , optoelectronics , optics , etching (microfabrication) , physics , layer (electronics) , atomic physics , nanotechnology , plasma , quantum mechanics
A single‐layer, all‐dielectric metasurface exhibiting a strong toroidal resonance in the low‐atmospheric loss radio window of the subterahertz W‐band is theoretically proposed and experimentally demonstrated. The metasurface is fabricated on a high‐resistivity floating‐zone silicon wafer by means of a single‐process, wet anisotropic etching technique. The properties of the toroidal mode of both the constituent dielectric elements and the metasurface are rigorously investigated by means of the multipole decomposition technique and full‐wave simulations. The experimental demonstration of such a compact, all‐silicon metasurface opens new venues of research in the investigation of toroidal modes and the engineering of functional millimeter‐wave components, which can be scaled to terahertz and higher frequencies of the electromagnetic spectrum.