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Large Area Three‐Dimensional Photonic Crystal Membranes: Single‐Run Fabrication and Applications with Embedded Planar Defects
Author(s) -
Chang Bingdong,
Zhou Chen,
Tarekegne Abebe Tilahun,
Yang Yuanqing,
Zhao Ding,
Jensen Flemming,
Hübner Jörg,
Jansen Henri
Publication year - 2019
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201801176
Subject(s) - materials science , fabrication , photonic crystal , optoelectronics , planar , lithography , reactive ion etching , photolithography , etching (microfabrication) , stepper , photonics , dry etching , optics , nanotechnology , medicine , alternative medicine , computer graphics (images) , physics , pathology , layer (electronics) , computer science
Three‐dimensional photonic crystals (3D PhCs) enable light manipulations in all three spatial dimensions, however, real world applications are still faced with challenges in fabrication. Here, a facile fabrication strategy for 3D silicon PhCs with a simple cubic (SC) lattice structure is presented, which exhibits a complete photonic bandgap at near‐infrared wavelengths of around 1100 nm. The fabrication process is composed of standard deep ultra‐violet stepper lithography, followed by a single‐run modified plasma etch process. By applying a direct dry etch release step at the end of the 3D structural etch process, the fabricated 3D PhCs can be released and transferred in the form of a membrane onto other substrates such as glass, polymers, or even substrates with engineered surface. The thickness of the demonstrated membranes is around 2 µm and the size can be up to a few millimeters. A high reflectivity is observed at the stop band frequency, and a planar defect is introduced during the etching process resulting in an optical resonance mode with a small linewidth of around 30 nm. The structure constitutes an optical bandpass filter and can be used as a sensor for organic solvents.