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All‐Dielectric Heterogeneous Metasurface as an Efficient Ultra‐Broadband Reflector
Author(s) -
Yao Yuhan,
Wu Wei
Publication year - 2017
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201700090
Subject(s) - materials science , broadband , dielectric , fabrication , nanoimprint lithography , optoelectronics , reflector (photography) , optics , lithography , design for manufacturability , bandwidth (computing) , computer science , telecommunications , medicine , mechanical engineering , light source , physics , alternative medicine , pathology , engineering
Conventional all‐dielectric metasurfaces made from high‐index and low‐loss materials (such as Si or GaAs) can achieve high optical efficiencies as well as broadband characteristics, mostly for the infrared (IR) light. However, maintaining the bandwidth and efficiency for conventional all‐dielectric metasurfaces for visible or near‐IR light becomes challenging, due to the limitations from material selection as well as fabrication techniques. In this paper, the idea of heterogeneous all‐dielectric metasurfaces is proposed for a better metasurface design in shorter‐wavelength ranges. An ultra‐broadband reflector, as a proof‐of‐principle demonstration, is presented in this paper, both numerically and experimentally. The broadband reflector demonstrates a good optical efficiency, a broadband reflectance, as well as a great manufacturability. Nanoimprint lithography patterning process and advanced etching recipes are developed for the large‐area and low‐cost heterogeneous metasurface fabrication.