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Nanoimprint Lithography: Angle‐Insensitive and CMOS‐Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016)
Author(s) -
Lee KyuTae,
Jang JiYun,
Park Sang Jin,
Ji Chengang,
Yang SungMo,
Guo L. Jay,
Park Hui Joon
Publication year - 2016
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201670062
Subject(s) - nanoimprint lithography , materials science , fabrication , optoelectronics , structural coloration , lithography , photonics , semiconductor , contact print , cmos , optics , nanotechnology , photonic crystal , medicine , alternative medicine , physics , pathology , composite material
Photonic nanostructures for a wide‐angle and complementary metal‐oxide semiconductor (CMOS)‐compatible structural color printing scheme, which eploite strong resonance effects in ultrathin subwavelength semiconductor gratings, are developed by H. J. Park and co‐workers. The proposed structural colors create distinctive colors with great homogeneity and high color saturation, which are easily tuned by varying the width of the subwavelength gratings, thereby enabling individual color pixels to be patterned via a one‐step fabrication process.