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Chemical Alkaline Etching of Silicon Mie Particles
Author(s) -
Proust Julien,
Bedu Frédéric,
Chenot Stéphane,
Soumahoro Ibrahima,
Ozerov Igor,
Gallas Bruno,
Abdeddaim Redha,
Bonod Nicolas
Publication year - 2015
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201500146
Subject(s) - materials science , silicon , etching (microfabrication) , resonator , isotropic etching , crystalline silicon , reactive ion etching , nanometre , amorphous solid , nanophotonics , nanotechnology , amorphous silicon , scanning electron microscope , optoelectronics , composite material , crystallography , chemistry , layer (electronics)
Chemical etching via alkaline solutions is associated with electronic lithography to structure at a nanometer scale silicon Mie resonators. Two different alkaline solutions are employed and their influences on the shape of the resonators are discussed. The method is applied on both amorphous and crystalline silicon coatings and silicon resonators are characterized by electron microscopy and optical spectroscopy, and then the different modes are identified thanks to numerical simulations. This method avoids the use of reactive ion etching and appears to be very well adapted to design silicon particles at a nanometer scale for applications in nanophotonics.