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Patterning: Optical Nanoscale Patterning Through Surface‐Textured Polymer Films (Advanced Optical Materials 9/2014)
Author(s) -
Fang Ming,
Lin Hao,
Cheung HoYuen,
Yip SenPo,
Xiu Fei,
Wong ChunYuen,
Ho Johnny C.
Publication year - 2014
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201470057
Subject(s) - materials science , fabrication , polymer , nanotechnology , nanoscopic scale , optoelectronics , optics , composite material , medicine , alternative medicine , physics , pathology
On page 855, J. C. Ho and co‐workers exploit a simple photolithographic technique using surface‐textured soft polymer films as optical masks for the area selective exposure of photoresists upon flood UV illumination. This allows rapid fabrication of periodic nanopatterns over large areas, and by simply varying the mask and tuning the exposure dose, patterns with different geometric characteristics can be obtained in a controllable manner. Importantly, these polymer masks can be used numerous times, making this technique a reliable low‐cost alternative to the existing methods.