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Optical Nanoscale Patterning Through Surface‐Textured Polymer Films
Author(s) -
Fang Ming,
Lin Hao,
Cheung HoYuen,
Yip SenPo,
Xiu Fei,
Wong ChunYuen,
Ho Johnny C.
Publication year - 2014
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201400127
Subject(s) - materials science , photoresist , nanoscopic scale , nanotechnology , fabrication , polymer , photovoltaics , plasmon , optoelectronics , photovoltaic system , composite material , layer (electronics) , medicine , ecology , alternative medicine , pathology , biology
Controllable nanoscale patterning of a photoresist is achieved via flood UV illumination with the assistance of conformably attached surface‐textured polymer films. These polymer films can be reused numerous times, enabling the cost‐effective and reliable fabrication of highly ordered nanopatterned arrays for widespread applications, from plasmonic sensors and multifunctional coatings to photovoltaics.