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Color Filters: Plasmonic Color Filter and its Fabrication for Large‐Area Applications (Advanced Optical Materials 2/2013)
Author(s) -
Do Yun Seon,
Park Jung Ho,
Hwang Bo Yeon,
Lee SungMin,
Ju ByeongKwon,
Choi Kyung Cheol
Publication year - 2013
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201370010
Subject(s) - materials science , color gel , color filter array , plasmon , fabrication , structural coloration , optoelectronics , filter (signal processing) , optics , lithography , optical filter , layer (electronics) , interference lithography , substrate (aquarium) , laser , photoresist , dielectric , interference (communication) , nanotechnology , computer science , telecommunications , photonic crystal , alternative medicine , pathology , geology , oceanography , computer vision , medicine , physics , thin film transistor , channel (broadcasting)
A plasmonic color filter (PCF) containing a metallic nanohole array is described by B.‐K. Ju, K. C. Choi, and co‐workers. This new PCF can be fabricated on an extremely large scale compared to the currently available alternatives, and the process can be adapted to create a flexible product. This is possible by using laser interference lithography based on Lloyd's mirror, as shown in the bottom left of the front cover image. The metal layer is positioned between two dielectric layers (which are different from the substrate), allowing high transmission. The filtering of all primary colors (red, green, and blue) is demonstrated on page 133.