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Arrays of Arbitrarily Shaped Nanoparticles: Overlay‐Errorless Direct Ion Write
Author(s) -
Gervinskas Gediminas,
Seniutinas Gediminas,
Rosa Lorenzo,
Juodkazis Saulius
Publication year - 2013
Publication title -
advanced optical materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.89
H-Index - 91
ISSN - 2195-1071
DOI - 10.1002/adom.201300027
Subject(s) - materials science , fabrication , lithography , nanoparticle , electron beam lithography , nanotechnology , sputtering , overlay , focused ion beam , colloidal gold , optoelectronics , ion , thin film , resist , computer science , medicine , alternative medicine , physics , pathology , layer (electronics) , quantum mechanics , programming language
A simple solution to lithographically write down to 20–30 nm features over micrometer‐sized nanoparticle arrays with high fidelity of pattern transfer from the designed to fabricated architectures is shown. It is achieved via a two‐step approach: (i) fabrication of basic shape nanoparticles by electron beam lithography, gold deposition via sputtering and lift‐off, then (ii) nano‐patterning by focused ion beam lithography. Application potential of 3D tailored nanoparticles for nanotweezers is discussed on the basis of numerical modeling and experimental measurements of extinction.