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Thermoelectric Films: Pulsed Hybrid Reactive Magnetron Sputtering for High zT Cu 2 Se Thermoelectric Films (Adv. Mater. Technol. 7/2017)
Author(s) -
PerezTaborda Jaime A.,
Vera Liliana,
CaballeroCalero Olga,
Lopez Elvis O.,
Romero Juan J.,
Stroppa Daniel G.,
Briones Fernando,
MartinGonzalez Marisol
Publication year - 2017
Publication title -
advanced materials technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.184
H-Index - 42
ISSN - 2365-709X
DOI - 10.1002/admt.201770032
Subject(s) - thermoelectric effect , materials science , sputter deposition , thermoelectric materials , seebeck coefficient , cavity magnetron , sputtering , optoelectronics , fabrication , electrical resistivity and conductivity , engineering physics , thin film , thermal conductivity , composite material , nanotechnology , electrical engineering , thermodynamics , engineering , physics , medicine , alternative medicine , pathology
In article number 1700012 , Marisol Martin‐Gonzalez and co‐workers report a novel technological approach to deposit highly efficient thermoelectric films via the pulsed hybrid reactive magnetron sputtering (PHRMS). PHRMS is a single‐step fabrication process with the ability to get even at room temperature high values of power factor and low values of thermal conductivity for films with the β‐Cu 2 Se phase and transferable to industry even for 2D materials.