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Graphene Nanopatterns: Lithographically Defined Graphene Patterns (Adv. Mater. Technol. 5/2017)
Author(s) -
Zheng Yiqun,
Wang Hua,
Hou Shifeng,
Xia Deying
Publication year - 2017
Publication title -
advanced materials technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.184
H-Index - 42
ISSN - 2365-709X
DOI - 10.1002/admt.201770019
Subject(s) - graphene , nanotechnology , materials science , nano , template , electron beam lithography , focused ion beam , physics , resist , ion , composite material , layer (electronics) , quantum mechanics
In article number 1600237 , Shifeng Huo, Deying Xia, and co‐workers review recent progress in lithographically defining graphene patterns such as nano‐ribbons, nano‐meshes, and nano‐gaps and their applications in electronic devices and sensors. The presented approaches include electron beam, ion beam, photons, and templates. Outlook and perspectives are discussed for new directions and performance improvement in this field in the future.