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Lithographically Defined Graphene Patterns
Author(s) -
Zheng Yiqun,
Wang Hua,
Hou Shifeng,
Xia Deying
Publication year - 2017
Publication title -
advanced materials technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.184
H-Index - 42
ISSN - 2365-709X
DOI - 10.1002/admt.201600237
Subject(s) - graphene , nanotechnology , nanolithography , materials science , lithography , electron beam lithography , next generation lithography , stencil lithography , nanoimprint lithography , fabrication , graphene nanoribbons , resist , optoelectronics , medicine , alternative medicine , pathology , layer (electronics)
With the maturation and development of graphene synthesis and deposition, the next challenge is to produce graphene patterns to advance the practical applications of graphene in areas related to energy, the environment, sensors, and health care. In recent years, lithographically defined graphene patterns have arisen and received considerable attention. The patterns generated by lithographical methods exhibit greater positional accuracy, nanoscale features, and better uniformity, in addition to producing ready‐to‐use final devices. Here, recent lithographical nanofabrication methods for the preparation of graphene nanopatterns, such as graphene nanoribbons and graphene nanomeshes, and their applications are reviewed. Fabrication techniques for graphene patterning are discussed, including electron‐beam lithography, nanoimprint lithography, nanosphere lithography, interferometric lithography, and ion beam lithography. Finally, future perspectives in the field are discussed.