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Nanogap Lithography: Spontaneous Formation of Nanogap Electrodes by Self‐Peeling Adhesion Lithography (Adv. Mater. Interfaces 17/2019)
Author(s) -
Luo Sihai,
Hoff Bård H.,
deMello John C.
Publication year - 2019
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201970107
Subject(s) - materials science , monolayer , lithography , substrate (aquarium) , adhesion , polymer , electrode , nanotechnology , fabrication , self assembled monolayer , metal , self assembly , polymer substrate , optoelectronics , composite material , chemistry , metallurgy , medicine , alternative medicine , pathology , oceanography , geology
In article number 1900243, Sihai Luo, Bård H. Hoff, and John C. deMello report the fabrication of nanogap electrodes using a modification of adhesion lithography. A metal is patterned on a substrate, and conformally coated with a self‐assembled monolayer (SAM). A second metal is then deposited over the full area of the substrate. Finally, a polymer film with a high coefficient of thermal expansion is spin‐cast onto the second metal from a heated solution. As it cools, the polymer delaminates and strips away those parts of the second metal that are in contact with the SAM, leaving the two metals side‐by‐side on the substrate, separated by a nanogap.