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Atomic Layer Deposition: 2D Transition Metal Dichalcogenide Thin Films Obtained by Chemical Gas Phase Deposition Techniques (Adv. Mater. Interfaces 3/2019)
Author(s) -
Park GyuHyeon,
Nielsch Kornelius,
Thomas Andy
Publication year - 2019
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201970024
Subject(s) - atomic layer deposition , materials science , chemical vapor deposition , thin film , transition metal , layer (electronics) , nanotechnology , deposition (geology) , combustion chemical vapor deposition , atomic layer epitaxy , electrochemistry , optoelectronics , chemical engineering , carbon film , electrode , catalysis , chemistry , organic chemistry , paleontology , sediment , engineering , biology
Ultrathin 2D transition metal dichalcogenide (TMD) thin films have attracted much attention due to their very good electrical, optical, and electrochemical properties. Here, the recent progress in 2D TMD thin films is reviewed and the current applications of these materials fabricated by chemical vapor deposition and atomic layer deposition are surveyed. More details are in article number 1800688 by Gyu‐Hyeon Park, Kornelius Nielsch, and Andy Thomas.