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Solution‐Processed and Transparent Graphene Oxide/TiO x Gas Barrier via an Interfacial Photocatalytic Reduction
Author(s) -
Byeon Jinhwan,
Lee JongHoon,
Kim Geunjin,
Back Hyungcheol,
Park Byoungwook,
Kim Jehan,
Lee Kwanghee
Publication year - 2020
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201901318
Subject(s) - materials science , graphene , oxide , photocatalysis , chemical engineering , substrate (aquarium) , transmittance , nanotechnology , water vapor , ultraviolet , fabrication , thin film , optoelectronics , organic chemistry , catalysis , medicine , chemistry , oceanography , alternative medicine , pathology , geology , engineering , metallurgy
A cost‐effective, flexible, and transparent gas barrier has been a main pursuit of research into plastics electronics. However, it is difficult to realize a high‐performance gas barrier on a plastic substrate via a solution process at low temperature. Here, by introducing an interfacial photocatalytic reduction between TiO x and graphene oxide (GO) films, a solution‐processed and transparent gas barrier film is demonstrated using reduced GO (rGO)/TiO x . A dramatic photochemical reduction of GO occurs at the interface between TiO x and the GO film under ultraviolet irradiation, which allows the fabrication of dense and uniform gas barrier films via a solution process at temperatures below 100 °C. In addition, the closely packed structure in the rGO film results in a decreased water vapor transmission rate (WVTR) of 0.37 g m −2 day −1 even with a thin rGO (<13 nm)/TiO x (7 nm) film, leading to a high transmittance of over 80% in the visible range.

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