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Progress in Powder Coating Technology Using Atomic Layer Deposition
Author(s) -
Adhikari Sangeeta,
Selvaraj Seenivasan,
Kim DoHeyoung
Publication year - 2018
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201800581
Subject(s) - atomic layer deposition , materials science , coating , nanotechnology , deposition (geology) , economies of agglomeration , homogeneous , particle (ecology) , layer (electronics) , process engineering , chemical engineering , engineering , thermodynamics , physics , paleontology , oceanography , sediment , geology , biology
Atomic layer deposition (ALD) has found versatile applications in energy, environmental, and anthropogenic systems. The self‐terminating surface chemistry characteristic of ALD allows for atomic‐level control over film thickness and has unlocked attractive avenues for the development of novel nanostructured systems. Substantial modifications of standard ALD processes are achieved with the advent of powder coating technology using ALD. The basic principle of ALD is demonstrated along with a focus on the significant parameters governing the process in order to achieve good surface characteristics. The aim of this review is to explore the challenges faced in the development of reactors for powder coatings and solve the problems associated with particle distribution in the reactors. A theoretical briefing on the agglomeration phenomena in particles is provided for a better understanding of the typical particle sizes and their distributions in reactor systems. The gradual improvement in reactor designs, with particular emphasis on the homogeneous distribution of particles, is also discussed. Conclusively, the authors also review the emerging applications where this technology is being explored to overcome surface defects through the control of atomic growth on particles.