Premium
Photonic Materials: Low‐Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High‐Temperature Applications (Adv. Mater. Interfaces 23/2017)
Author(s) -
Furlan Kaline P.,
Krekeler Tobias,
Ritter Martin,
Blick Robert,
Schneider Gerold A.,
Nielsch Kornelius,
Zierold Robert,
Janßen Rolf
Publication year - 2017
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201770122
Subject(s) - materials science , ternary operation , mullite , atomic layer deposition , crystallite , photonic crystal , coating , oxide , scanning electron microscope , photonics , deposition (geology) , layer (electronics) , chemical engineering , nanotechnology , composite material , optoelectronics , metallurgy , ceramic , paleontology , sediment , biology , computer science , engineering , programming language
Kaline P. Furlan, Robert Zierold, Rolf Janßen, and co‐workers develop an atomic layer deposition super cycle to coat photonic crystals with hightemperature stable films in article 1700912 . By means of such ternary oxide coating the photonic crystal periodically organized structure is kept stable up to 1400 °C, which is an outstanding behavior concerning the temperature stability. The scanning electron microscopy image shows a top view of a mullite coated photonic crystal, in which the nanosized mullite crystallites are visualized.