Hot Wire ALD: Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry (Adv. Mater. Interfaces 18/2017) | Zendy

Kovalgin Alexey Y. | Zendy; Yang Mengdi | Zendy; Banerjee Sourish | Zendy; Apaydin Ramazan O. | Zendy; Aarnink Antonius A. I. | Zendy; Kinge Sachin | Zendy; Wolters Rob A. M. | Zendy

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Hot Wire ALD: Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry (Adv. Mater. Interfaces 18/2017)

Author(s) -

Kovalgin Alexey Y.,

Yang Mengdi,

Banerjee Sourish,

Apaydin Ramazan O.,

Aarnink Antonius A. I.,

Kinge Sachin,

Wolters Rob A. M.

Publication year - 2017

Publication title -

advanced materials interfaces

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.671

H-Index - 65

ISSN - 2196-7350

DOI - 10.1002/admi.201770095

Subject(s) - atomic layer deposition , materials science , tungsten , in situ , substrate (aquarium) , ellipsometry , layer (electronics) , nanotechnology , chemical engineering , thin film , metallurgy , chemistry , organic chemistry , oceanography , geology , engineering

The cover depicts a reactor utilized for hot‐wire assisted atomic layer deposition (Hot Wire ALD), enabling formation of reactive species (radicals) at low substrate temperatures, without the use of plasma. A tungsten filament heated up to1300–2000 °C is installed on the side. The reactor is equipped with an in situ spectroscopic ellipsometer, as reported by Alexey Y. Kovalgin and co‐workers in article number 1700058 .

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