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Optoelectronic Devices: Wafer‐Scale Highly Ordered Anodic Aluminum Oxide by Soft Nanoimprinting Lithography for Optoelectronics Light Management (Adv. Mater. Interfaces 5/2017)
Author(s) -
Zhang Chi,
Li Wenchao,
Yu Dongliang,
Wang Yanshan,
Yin Min,
Wang Hui,
Song Ye,
Zhu Xufei,
Chang Paichun,
Chen Xiaoyuan,
Li Dongdong
Publication year - 2017
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201770027
Subject(s) - materials science , anodizing , lithography , wafer , nanolithography , optoelectronics , nanotechnology , nanostructure , nanoscopic scale , oxide , porosity , soft lithography , aluminium , fabrication , composite material , metallurgy , medicine , alternative medicine , pathology
D. Li, P. Chang and co‐workers present the largearea highly ordered porous anodic aluminum oxide (HOAAO) membranes based on full‐field nanoimprinting lithography using soft stamps and electrochemical anodization in article number 1601116. The porous films with straight nanochannels and inverted nanocones are rationally obtained via finely tuned electrochemical anodization. In addition, the large area HOAAO films with tunable nanostructures can provide a versatile platform for high‐performance optoelectronic devices.