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In Recognition of Professor Hitchman: Advances in Chemical Vapor Deposition
Author(s) -
Maury Francis,
Alexandrov Sergey,
Barreca Davide,
Davazoglou Dimitris,
Pemble Martyn
Publication year - 2017
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201700984
Subject(s) - materials science , chemical vapor deposition , nanotechnology , deposition (geology) , engineering physics , chemical engineering , engineering , paleontology , sediment , biology
Chemical vapor deposition (CVD) processes had been around for nearly 100 years before they began to attract interest from materials scientists and electronics engineers in the 60s and 70s, as a result of the rapidly growing microelectronics industry. The successful development of this complicated technology required a deep physicochemical understanding of deposition processes and reaction mechanisms. This resulted in a large number of scientists from different disciplines studying the basics of CVD.